The technique for non-destructive and non-contact analysis and measurement of film properties is known as ellipsometry. The device used for this purpose is called an ellipsometer. An ellipsometer can measure the refractive index or thickness of single layer films such as oxides, nitrides and photoresists with high precision. In the case of multi-layer films, the properties of both the lower and upper layers can be analyzed. Ellipsometers are used to measure films whose thickness is thinner than 300-400 nm or to measure film structures with three or more layers. Ellipsometers are considered an accurate tool for thin film measurement and are growing in popularity.

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Ellipsometry is one of the powerful and established tools for measuring thin layers. This method is often used to analyze the dielectric functions of different substrates or multilayer materials. With the help of ellipsometry it is possible to measure the magnitude and phase of the polarization components of the light at the same time. The light sources commonly used in ellipsometry are halogen lamps or high pressure arc discharge plasma lamps. Spectrometers are relatively simple and require no complex setup or sample preparation. They can be built with lightweight opto-mechanical components and have a relatively compact design. It can also be coupled with other systems such as vacuum chambers, chemical reactors or bioreactors. The major players that offer ellipsometers are engaged in the development and introduction of innovative and advanced products in the market. They focus on developing products that feature advanced optical design and wide spectral range, ensuring fast data acquisition. In addition, the major players are also offering various software upgrades for the ellipsometer for their existing models to improve their…